Georgia Tech Facilities
Marcus Nanotechnology Building
Microelectronics Research Center (MiRC)
- 8,500 sf cleanroom including a 4 nm JEOL 9300FS e-beam lithographer.
- 2in SiC wafers graphitization furnace
Physics NanoFab Facility
- Prototype e-beam lithography patterning (JEOL JSM-5900 SEM), wafer-processing fume hood with spinner.
Center for Nanostructure Characterization
- Scanning and transmission electron microscopes with materials analysis.
- Hitachi HF-2000, JEOL 4000EX, JEOL 100CX II, Hitachi S800, LEO 1530
This material is based upon work supported by the MRSEC Program of the National Science Foundation No. DMR 0820382. Any opinions, findings, and conclusions or recommendations expressed in this material are those of the authors and do not necessarily reflect the views of NSF.